Plasma System – Quadrio α High Volume Plasma System

With maximum uniformity, superior gas and RF distribution, a proprietary controlling software and compliance to CE and SEMI international standards, our plasma cleaning and etching systems are ideal for all applications where process reliability and repeatability are a must.

Description

Quadrio α is a compact standalone plasma cleaning system suitable for substrates with a strip form factor.

Capable of performing PE and RIE processes, the Quadrio^α provides high uniformity reliable results with a competitive throughput.

Product Features:

Quadrio α comes in two versions:

Quadrio^α4 with 4 tracks, 400 UPH*
Quadrio^α5 with 5 tracks, 500 UPH*